Structural properties of Ag-CuO thin films on silicon prepared via DC magnetron sputtering

Document Type : Original Article


1 Department Physics, College of Science, University of Kerbala-56001, Iraq

2 Chemistry Department, College of Science, University of Misan, Misan

3 Ministry of Science and Technology, Baghdad- 10065 ,Iraq


In this paper, 3% and 5 % of Ag doped copper oxide (CuO) deposited onto silicon substrates as thin film using the DC magnetron sputtering process under Ar gas. The sputtering deposition was performed by using a power of 75 W. XRD results conformed a good crystallinity of the synthesized Ag/CuO nanoparticle thin films. SEM analysis indicated to all the prepared samples are having a quasi-spherical shape. Based on AFM analysis, the roughness of prepared samples determined and found the high roughness of 3% Ag/CuO sample that attitude to have it a less mean crystal size compated with 5% Ag/CuO, which calculated using Scherrer equation. The EDX spectra indicated the high purities for the prepared sample befor and after deposted on Si as substrate


Main Subjects

  • Receive Date: 17 August 2021
  • Revise Date: 10 October 2021
  • Accept Date: 12 October 2021
  • First Publish Date: 12 October 2021