Fabrication, Characterization, And Monitoring Of The Propagation Of Nanocrystalline Zno Thin Film On Ito Substrate Using Electrodeposition Technique

Document Type : Original Article


1 Central Metallurgical Research and Development Institute, P.O Box 87 Helwan, Cairo, Egypt

2 Nanotechnology central lab, Electronics Research Institute (ERI), Cairo, Egypt

3 National Research Centre, Physical Chemistry Department, Electrochemistry and Corrosion Lab., El-Bohouth St. 33, Dokki, P.O. 12622, Giza


At varying temperatures ranging from 25 0C to 75 0C, nanocrystalline zinc oxide ZnO films were customized onto indium doped tin oxide (ITO) substrates based on aqueous solutions of zinc nitrate. The electrodeposition technique was used to achieve this procedure. To grasp the deposition strategy, linear sweep voltammetry and chronopotentiometry procedures were completed, and the effects of different factors were evaluated and discussed. Temperature and current have a significant influence on the development of ZnO films. According to the model developed by Scharifker and Hills, the mechanism of nucleation altered with the potential, and it was discovered to be instantaneous at potentials between -800 and -1200 mV. At voltages greater than -1400 mV, the method of development was non-instantaneous and gradual. Following the X-ray profiles, the production of the Zincite phase with a crystallite size of 61 nm was confirmed, and the films that were created were smooth and compact


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